Designed for the most demanding UV applications, our high-energy excimer laser mirrors have low loss dielectric coatings to minimize scatter and maximize reflected energy.
High reflectivity dielectric coatings
High damage threshold
Optimized for 0° or 45° AOI
UV fused silica substrate for low thermal expansion and absorption
We offer excimer mirrors coated for a 0° angle of incidence for KrF (248 nm), XeCl (308 nm), and XeF (351–353 nm) lasers. Reflectivity at 248, 308, and 351–353 nm is greater than 99%.
45° Incidence Angle Coatings
We offer excimer mirrors coated for a 45° angle of incidence for KrF (248 nm), XeCl (308 nm), and XeF (351–353 nm) lasers. Reflectivity at 248, 308, and 351–353 nm is greater than 99%.
UV Fused Silica Substrates
Fused Silica is synthetic amorphous silicon dioxide of extremely high purity. This non-crystalline, colorless silica glass combines a low content of inclusions with high refractive index homogeneity, a very low thermal expansion coefficient, and excellent transmittance in the wavelength regime from UV to NIR. As a result, these mirrors will perform better with temperature fluctuations and is ideal for high-energy laser applications due to its high energy damage threshold. For more information, please see our Optical Materials technical note.
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