Application Notes

Ophthalmic Surgery

Application Notes

The laser is particularly suited to ophthalmic surgery since it can provide a non-contact method of interacting with the cornea or even the interior of the eye, including the lens and the retina.

Super-Resolution Microscopy (STED and PALM)

Application Notes

One super-resolution approach is called stimulated emission depletion (STED) microscopy. This technique uses a confocal microscope and a diffraction limited excitation beam that is scanned across the sample.

LiDAR

Application Notes

LiDAR is an active remote sensing technique that is similar to RADAR but, instead of using radio waves as a radiation source, it uses laser pulses. In this technique, a laser source emits pulses that are directed towards the target of interest.

Flat Panel Display Manufacturing

Application Notes

As the flat panel display market moves from LCD to OLED display technology, laser patterning and cutting of heterogeneous materials (comprised of multiple organic material films) with high quality and accuracy is needed.

PCB Manufacturing

Application Notes

Lasers are routinely used in a variety of PCB manufacturing processes including via drilling, depaneling, profiling, laser direct imaging, repair, trimming, and marking. Laser processing completely eliminates mechanical stress on the material.

Solar Panel Manufacturing

Application Notes

Crystalline-Silicon solar cells are the predominant solar cell technology used in fabricating solar panels because of the availability of silicon, well-developed manufacturing processes, and the high conversion efficiencies that can be achieved.

Semiconductor Inspection

Application Notes

In this application note, we provide a brief description of the basics of wafer and reticle inspection techniques and discuss the characteristics of current inspection tools.

Semiconductor Lithography Overview

Application Notes

Lithography is defined as "a method of printing from a flat surface (such as a smooth stone or a metal plate) that has been prepared so that the ink will only stick to the design that will be printed".

Deep UV Photolithography

Application Notes

DUV technology for photolithography is exclusively based on projection optics since the pattern on the photomask is much larger than the final pattern developed on the photoresist.

Extreme UV Photolithography

Application Notes

EUV lithography is being developed to fulfill single-exposure patterning requirements at feature sizes below 22 nm. Unique to this technology is the nature of the light source.
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