Compare Model Drawings, CAD & Specs Availability Price
UV Bandpass Filter, 25.4 mm, 206±2 nm Center, 12±2 nm FWHM
$360
6 Weeks
6 Weeks
UV Bandpass Filter, 25.4 mm, 214±3 nm Center, 11±3 nm FWHM
$371
6 Weeks
6 Weeks
UV Bandpass Filter, 25.4 mm, 228±2 nm Center, 11±3 nm FWHM
$360
In Stock
In Stock
UV Bandpass Filter, 25.4 mm, 232±2 nm Center, 11±3 nm FWHM
$360
In Stock
In Stock
UV Bandpass Filter, 25.4 mm, 239±2 nm Center, 11±3 nm FWHM
$360
In Stock
In Stock
UV Bandpass Filter, 25.4 mm, 250±3 nm Center, 11±3 nm FWHM
$371
6 Weeks
6 Weeks
UV Bandpass Filter, 25.4 mm, 260±3 nm Center, 11±3 nm FWHM
$371
In Stock
In Stock
UV Bandpass Filter, 25.4 mm, 265±2 nm Center, 12±2 nm FWHM
$360
In Stock
In Stock
UV Bandpass Filter, 25.4 mm, 270±3 nm Center, 12±2 nm FWHM
$371
In Stock
In Stock
UV Bandpass Filter, 25.4 mm, 280±3 nm Center, 12±2 nm FWHM
$371
6 Weeks
6 Weeks
UV Bandpass Filter, 25.4 mm, 289±3 nm Center, 12±2 nm FWHM
$371
In Stock
In Stock
UV Bandpass Filter, 25.4 mm, 295±2 nm Center, 12±2 nm FWHM
$360
In Stock
In Stock
UV Bandpass Filter, 25.4 mm, 300±3 nm Center, 12±2 nm FWHM
$371
1 Week
1 Week

Specifications

  • Type
    UV Bandpass Filter
  • Size
    Ø25.4 mm
  • Effective Index of Refraction
    1.39
  • Surface Quality
    80-50 scratch-dig
  • Thickness
    5.1 mm
  • Size Tolerance
    +0/-0.5 mm
  • Minimum Peak Transmission
    12%
  • Clear Aperture
    20.2 mm
  • Temperature Range
    -50° to +100°C
  • Wavelength Shift with Temperature
    0.01 to 0.02 nm/°C
  • Humidity Resistance
    Per MIL-STD-810E, method 507.3, procedure III, modified to 5 cycles

Features

Argon-Gap Technology

Our UV band-pass filters in the 214 nm to 300 nm range are fabricated using our Argon-Gap Technology. These filters demonstrate superior spectral stability and field lifetime in demanding applications such as water purification and environmental monitoring. Argon-Gap technology employs a proprietary sealing process that eliminates sources of solarization by-products, such as epoxy sealants. Solarization by-products, which are created by the chemical breakdown of organic materials resulting from exposure to ultraviolet light, are a principal cause of premature failure of short-UV filters.

Transmittance Data Curve for 206 to 239 nm Models

Transmittance Data Curve for 250 to 300 nm Models

Optical Filter Mounts