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Broadband Turning Mirror, Ultrafast, 25.4 mm, P Pol, 670-1340 nm
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In Stock
Broadband Turning Mirror, Ultrafast, 25.4 mm, S Pol, 670-1340 nm
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In Stock



Wide Spectral Bandwidth

Our Ultrafast Super Broadband Turning Mirrors are designed to steer beams at 45 degrees AOI with over 99.6% reflection across the extremely wide 670 to 1340 nm range. The back surface of the mirror is polished to enable transmission of visible wavelengths.

Minimal Effect on Pulse Dispersion

Ultrafast broadband turning mirrors have a slightly negative group delay dispersion from 670 to 1340 nm.

Theoretical GDD for UF.55 Coating

Slight Wedge to Suppress Interference Effects

Our ultrafast mirrors may be used as dichroic mirrors in pump probe laser applications. The mirrors have a 10 arc minute wedge angle to suppress interference fringes for the transmitted beam. Note that performance outside of the specified wavelength range cannot be guaranteed.

Two Photon Microscopy Applications

In two photon microscopy, biological samples are illuminated with focused ultrashort pulsed infrared lasers. At the focal point molecules may absorb two photons then fluoresce in the visible range. These incident pulses often span a very broad wavelength range. Intensity of the fluorescence signal depends strongly on laser pulse width and peak power. Our mirrors allow redirection of Ti Sapphire beams for all possible wavelength ranges with minimal power loss and pulse broadening for optimal system efficiency.

Fused Silica Substrates

Fused Silica is a synthetic amorphous silicon dioxide of extremely high purity. This non-crystalline, colorless silica glass combines a very low thermal expansion coefficient with good optical qualities and high damage threshold. As a substrate for our ultrafast mirrors, they provide excellent λ/10 surface flatness and 20-10 scratch-dig surface quality. For more information, refer to the optical material technical note.