The Shear Plate Collimation Tester allows quick and easy beam collimation, significantly speeding up the process of aligning optical setups. UV Fused Silica substrate material enables use across a wide 195 to 2100 nm wavelength range.
Speed up alignment for quick & easy beam collimation testing
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shear-plate-collimation-tester - Drawings
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Specifications
Diameter
50.8 mm
Material
UV Grade Fused Silica
Wavelength Range
195-2100 nm
Surface Flatness
≤λ/10 at 632.8 nm over the clear aperture
Surface Quality
60-40 scratch-dig
Thickness
9.4 mm (nominal)
Thickness Tolerance
±0.5 mm
Chamfers
0.38–1.14 mm face width
Chamfers Angle/Tolerance
45° ±15°
Clear Aperture
Central 80% of diameter
Diameter Tolerance
+0/-0.25 mm
Antireflection Coating
Uncoated
Wedge
4.4 ± .88 arc sec
Features
Shear Plate Orientation
The edge of the optic is marked with an arrow indicating the thickest part of the optic. The arrow points toward the front surface of the optic, which should face the incident beam. For a horizontally propagating beam the mark should be positioned on top so that the wedge is perpendicular to the plane of incidence.
Use Plate at 45-degree AOI for Best Results
When the collimation tester is aligned at a 45º angle of incidence with respect to the incident beam, an interference pattern is formed. By adjusting the input beam condition and observing the fringe pattern, the collimation of the beam can be accurately obtained.
When a horizontal beam is collimated, fringes will be horizontally oriented. If a beam is diverging or converging, fringe orientation will be tilted slightly.
UV Fused Silica for UV, Laserline & Broadband Applications
UV Grade Fused Silica is synthetic amorphous silicon dioxide of extremely high purity providing maximum transmission from 195 to 2100 nm. This non-crystalline, colorless silica glass combines a very low thermal expansion coefficient with good optical qualities, and excellent transmittance in the ultraviolet region. Transmission and homogeneity exceed those of crystalline quartz without the problems of orientation and temperature instability inherent in the crystalline form. It will not fluoresce under UV light and is resistant to radiation. For high-energy applications, the extreme purity of fused silica eliminates microscopic defect sites that could lead to laser damage.
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