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Shear Plate Collimation Tester, 50.8 mm, UV Fused Silica
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  • Diameter
    50.8 mm
  • Material
    UV Grade Fused Silica
  • Wavelength Range
    195-2100 nm
  • Surface Flatness
    ≤λ/10 at 632.8 nm over the clear aperture
  • Surface Quality
    60-40 scratch-dig
  • Thickness
    9.4 mm (nominal)
  • Thickness Tolerance
    ±0.5 mm
  • Chamfers
    0.38–1.14 mm face width
  • Chamfers Angle/Tolerance
    45° ±15°
  • Clear Aperture
    Central 80% of diameter
  • Diameter Tolerance
    +0/-0.25 mm
  • Antireflection Coating
  • Wedge
    4.4 ± .88 arc sec


Shear Plate Orientation

The edge of the optic is marked with an arrow indicating the thickest part of the optic. The arrow points toward the front surface of the optic, which should face the incident beam. For a horizontally propagating beam the mark should be positioned on top so that the wedge is perpendicular to the plane of incidence.

Use Plate at 45-degree AOI for Best Results

When the collimation tester is aligned at a 45º angle of incidence with respect to the incident beam, an interference pattern is formed. By adjusting the input beam condition and observing the fringe pattern, the collimation of the beam can be accurately obtained.

Interpreting Shear Plate Collimator Tester Fringes

When a horizontal beam is collimated, fringes will be horizontally oriented. If a beam is diverging or converging, fringe orientation will be tilted slightly.

UV Fused Silica for UV, Laserline & Broadband Applications

UV Grade Fused Silica is synthetic amorphous silicon dioxide of extremely high purity providing maximum transmission from 195 to 2100 nm. This non-crystalline, colorless silica glass combines a very low thermal expansion coefficient with good optical qualities, and excellent transmittance in the ultraviolet region. Transmission and homogeneity exceed those of crystalline quartz without the problems of orientation and temperature instability inherent in the crystalline form. It will not fluoresce under UV light and is resistant to radiation. For high-energy applications, the extreme purity of fused silica eliminates microscopic defect sites that could lead to laser damage.