Designed for the most demanding UV applications, our high-energy excimer laser mirrors have low loss dielectric coatings to minimize scatter and maximize reflected energy.
- High reflectivity dielectric coatings
- High damage threshold
- Optimized for 0° or 45° AOI
- UV fused silica substrate for low thermal expansion and absorption See All Features
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Specifications
- Wavelength Range248 nm, 308 nm, 351-353 nm
- Mirror ShapeRound
- Diameter25.4 mm, 50.8 mm
- MaterialUV Grade Fused Silica
- Surface Quality10-5 scratch-dig
- Surface Flatnessλ/10 at 632.8 nm
- Wedge≤3 arc min
- Clear Aperture≥central 80% of diameter
- Thickness6.35 mm, 9.65 mm
- Thickness Tolerance±0.5 mm
- Diameter Tolerance+0/-0.25 mm
- Chamfers Angle Tolerance45° ±15°
- Cleaning
Features
UV Fused Silica Substrates
Fused Silica is synthetic amorphous silicon dioxide of extremely high purity. This non-crystalline, colorless silica glass combines a low content of inclusions with high refractive index homogeneity, a very low thermal expansion coefficient, and excellent transmittance in the wavelength regime from UV to NIR. As a result, these mirrors will perform better with temperature fluctuations and is ideal for high-energy laser applications due to its high energy damage threshold. For more information, please see our Optical Materials technical note.










