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High-Energy Excimer Laser Mirrors
High-Energy Excimer Laser Mirrors
Designed for the most demanding UV applications, our high-energy excimer laser mirrors have low loss dielectric coatings to minimize scatter and maximize reflected energy.
- High reflectivity dielectric coatings
- High damage threshold
- Optimized for 0° or 45° AOI
- UV fused silica substrate for low thermal expansion and absorption See All Features
| Compare | Description | Drawings, CAD & Specs | Avail. | Price | ||
|---|---|---|---|---|---|---|
 | 10QM20EM.15 | In Stock | ||||
| 10QM20EM.20 | In Stock | ||||
| 10QM20EM.25 | In Stock | ||||
 | 10QM20EM.35 | In Stock | ||||
| 20QM20EM.15 | In Stock FREE 2-day shipping on thousands of products on Newport.com Learn More | ||||
| 20QM20EM.25 | |||||
| 20QM20EM.35 | In Stock |
Specifications
- Wavelength Range248 nm, 308 nm, 351-353 nm
- Mirror ShapeRound
- Diameter25.4 mm, 50.8 mm
- MaterialUV Grade Fused Silica
- Surface Quality10-5 scratch-dig
- Surface Flatnessλ/10 at 632.8 nm
- Wedge≤3 arc min
- Clear Aperture≥central 80% of diameter
- Thickness6.35 mm, 9.65 mm
- Thickness Tolerance±0.5 mm
- Diameter Tolerance+0/-0.25 mm
- Chamfers Angle Tolerance45° ±15°
- Cleaning
Features
0° Incidence Angle Coatings
We offer excimer mirrors coated for a 0° angle of incidence for KrF (248 nm), XeCl (308 nm), and XeF (351–353 nm) lasers. Reflectivity at 248, 308, and 351–353 nm is greater than 99%.
45° Incidence Angle Coatings
We offer excimer mirrors coated for a 45° angle of incidence for KrF (248 nm), XeCl (308 nm), and XeF (351–353 nm) lasers. Reflectivity at 248, 308, and 351–353 nm is greater than 99%.
UV Fused Silica Substrates
Fused Silica is synthetic amorphous silicon dioxide of extremely high purity. This non-crystalline, colorless silica glass combines a low content of inclusions with high refractive index homogeneity, a very low thermal expansion coefficient, and excellent transmittance in the wavelength regime from UV to NIR. As a result, these mirrors will perform better with temperature fluctuations and is ideal for high-energy laser applications due to its high energy damage threshold. For more information, please see our Optical Materials technical note.