Low GDD Mirror, Ytterbium Laser, 45° AOI, 25.4 mm, 505-530 nm and 1020-1050 nm
Low GDD Mirror, Ytterbium Laser, 45° AOI, 25.4 mm, 505-530 nm and 1020-1050 nm
Model: 10QM20UF.DF55
In Stock
Product Series Overview
Ytterbium Doped Ultrafast MirrorsThe 10QM20UF.DF55 is a low GDD Ytterbium Laser Mirror optimized for 505-530 and 1020-1050 nm. Made out of fused silica, the mirror size is 25.4 mm in diameter and 6 mm thick. This ultrafast mirror is ideal as a high reflectance steering mirror for Ytterbium lasers at 45° angle of incidence. Careful thin film design and advanced coating processes result in a mirror with maximum reflectivity with minimum effect on pulse dispersion.
Specifications
- Wavelength RegionVIS & IR
- Wavelength Range505-530 nm & 1020-1050 nm
- Mirror ShapeRound
- Diameter25.4 mm
- MaterialFused Silica
- Coating TypeLaser Line Ultrafast Dielectric
- Coating CodeDF.F55
- ReflectivityR > 99.5% @ 505-530 nm & 1020-1050 nm
- Surface Quality20-10 scratch-dig
- Surface Flatnessλ/10 at 632.8 nm
- Wedge≤ 30 arc sec
- Angle of Incidence45°
- Clear Aperture≥central 80% of diameter
- Back SurfaceCommercial Polished
- Thickness6.0 mm
- Thickness Tolerance±0.5 mm
- Diameter Tolerance+0/-0.3 mm
- Chamfers0.25–0.75 mm face width
- Chamfers Angle Tolerance45° ±15°
- Cleaning
Resources & Downloads
3D Product Models
Other
10QM20UF.DF55 RoHS Certificate(265.9 kB, PDF) 10QM20UF.DF55_ROHS2-2021.pdf(282.3 kB, PDF)
2D Product Drawings
10QM20UF.DF55 Drawing(69.9 kB, PDF)
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