Compare Model Drawings, CAD & Specs Availability Price
Ytterbium Laser Low GDD Mirror, 45° AOI, 25.4 mm, 505-530 nm and 1020-1050 nm
$302
In Stock
10QM20UF.DF55 Ytterbium Laser Low GDD Mirror, 45° AOI, 25.4 mm, 505-530 nm and 1020-1050 nm
In Stock
$302
Ytterbium Laser Low GDD Mirror, 45° AOI, 25.4 mm, 1020-1050 nm
$253
In Stock
10QM20UF.F15 Ytterbium Laser Low GDD Mirror, 45° AOI, 25.4 mm, 1020-1050 nm
In Stock
$253
Ytterbium Laser Low GDD Mirror, 45° AOI, 25.4 mm, 505-530 nm
$213
In Stock
10QM20UF.F55 Ytterbium Laser Low GDD Mirror, 45° AOI, 25.4 mm, 505-530 nm
In Stock
$213

Specifications

Features

The Popular Ytterbium Doped Laser

There are many types of Ytterbium doped lasers ranging from the compact fiber lasers to high performance femtosectond lasers such as the Spirit® laser from Spectra-Physics. Applications include ablation, cutting, drillig, welding, marking, laser sintering, and eye surgery.  

High Reflectivities For Single Ytterbium Wavelengths

High reflectivities are offered for popular Ytterbium wavelengths. The 10QM20UF.F15 and 10QM20UF.F55 offer Rs, Rp > 99.5% for 1020-1050 nm or 505-530 nm, respectively. All mirrors are made from high quality fused silica with multilayer dielectric coatings.

Dual Wavelength Mirror

The 10QM20UF.DF55, is a dual wavelength mirror reflecting both the fundamental and second harmonic.  This mirror offers an average reflectivity (S+P)/2 polarization > 99.5%.  All mirrors are made from high quality fused silica with multilayer dielectric coatings.

UV Fused Silica Substrate Provides Low Thermal Expansion and Low Material Absorption

UV grade fused silica is used as a substrate material for the Broadbeam mirrors for low thermal expansion and low material absorption in the wavelength regime of 350 to 1100 nm. As a result, Broadbeam mirrors will perform better with temperature fluctuations and will have better resistance from environmental effects compared to many other metallic and dielectric mirrors used in these wavelength ranges. For more information, refer to the optical material technical note.

Fused Silica Substrates

Fused Silica is a synthetic amorphous silicon dioxide of extremely high purity. This non-crystalline, colorless silica glass combines a very low thermal expansion coefficient with good optical qualities and high damage threshold. As a substrate for our ultrafast mirrors, they provide excellent λ/10 surface flatness and 20-10 scratch-dig surface quality. For more information, refer to the optical material technical note.