Compare Model Drawings, CAD & Specs Wavelength Range Angle of Incidence Diameter Thickness Availability Price
10QM20EM.15
$419
In Stock
 10QM20EM.15 248 nm 45° 25.4 mm 6.35 mm
In Stock
 $419
10QM20EM.20
$499
In Stock
 10QM20EM.20 308 nm 0° 25.4 mm 6.35 mm
In Stock
$499
10QM20EM.25
$459
In Stock
 10QM20EM.25 308 nm 45° 25.4 mm 6.35 mm
In Stock
 $459
10QM20EM.35
$440
In Stock
 10QM20EM.35 351-353 nm 45° 25.4 mm 6.35 mm
In Stock
 $440
20QM20EM.15
$529
In Stock
 20QM20EM.15 248 nm 45° 50.8 mm 9.65 mm
In Stock
 $529
20QM20EM.25
$715
Contact Us
 20QM20EM.25 308 nm 45° 50.8 mm 9.65 mm
Contact Us
 $715
20QM20EM.35
$746
In Stock
 20QM20EM.35 351-353 nm 45° 50.8 mm 9.65 mm
In Stock
 $746

Specifications

  • Wavelength Range
    248 nm, 308 nm, 351-353 nm
  • Mirror Shape
    Round
  • Diameter
    25.4 mm, 50.8 mm
  • Material
    UV Grade Fused Silica
  • Surface Quality
    10-5 scratch-dig
  • Surface Flatness
    λ/10 at 632.8 nm
  • Wedge
    ≤3 arc min
  • Clear Aperture
    ≥central 80% of diameter
  • Thickness
    6.35 mm, 9.65 mm
  • Thickness Tolerance
    ±0.5 mm
  • Diameter Tolerance
    +0/-0.25 mm
  • Chamfers Angle Tolerance
    45° ±15°
  • Cleaning
    See How to Clean Optics

Features

0° Incidence Angle Coatings

We offer excimer mirrors coated for a 0° angle of incidence for KrF (248 nm), XeCl (308 nm), and XeF (351–353 nm) lasers. Reflectivity at 248, 308, and 351–353 nm is greater than 99%.

45° Incidence Angle Coatings

We offer excimer mirrors coated for a 45° angle of incidence for KrF (248 nm), XeCl (308 nm), and XeF (351–353 nm) lasers. Reflectivity at 248, 308, and 351–353 nm is greater than 99%.

UV Fused Silica Substrates

Fused Silica is synthetic amorphous silicon dioxide of extremely high purity. This non-crystalline, colorless silica glass combines a low content of inclusions with high refractive index homogeneity, a very low thermal expansion coefficient, and excellent transmittance in the wavelength regime from UV to NIR. As a result, these mirrors will perform better with temperature fluctuations and is ideal for high-energy laser applications due to its high energy damage threshold. For more information, please see our Optical Materials technical note.

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